DocumentCode
2711818
Title
Automated extraction of matching parameters for bipolar transistor technologies
Author
Connor, S.D. ; Evanson, D.
Author_Institution
Microelectron. Centre, GEC Plessey Semicond. Ltd., Hollinwood, UK
fYear
1996
fDate
25-28 Mar 1996
Firstpage
33
Lastpage
38
Abstract
We present here a technique for automatically producing statistical data for bias and resistor mis-match on bipolar transistor technologies by use of a nulled differential amplifier. The method has been developed to enable automatic wafer probe and the generation of distributions and wafer maps. The data is analysed using software from the SAS Institute and the method allows extraction of both resistor and VBE mis-match from a single circuit
Keywords
bipolar transistors; differential amplifiers; automated measurement; bias mismatch; bipolar transistor; matching parameters; nulled differential amplifier; resistor mismatch; software; statistical data; wafer map; wafer probe; Bipolar transistors; Circuits; Electron emission; Gain measurement; Microelectronics; Resistors; Semiconductor materials; Tail; Virtual manufacturing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on
Conference_Location
Trento
Print_ISBN
0-7803-2783-7
Type
conf
DOI
10.1109/ICMTS.1996.535618
Filename
535618
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