DocumentCode :
2711849
Title :
Test structure to measure the gate-drain coupling capacitor using accelerated techniques
Author :
Manku, T.
Author_Institution :
Tech. Univ. Nova Scotia, Halifax, NS, Canada
fYear :
1996
fDate :
25-28 Mar 1996
Firstpage :
51
Lastpage :
53
Abstract :
In this paper, we present a test structure to measure the gate-drain coupling capacitance. The test structure has been implemented within a standard CMOS process. The structure uses charge coupling as a means to measure the gate-drain capacitance. Furthermore, the test structure can measure the gate-drain capacitance is less that 10 ms. The basic structure consists of two MOS transistors connected by their gates
Keywords :
MOSFET; capacitance measurement; semiconductor device testing; 10 ms; CMOS process; MOS transistor; accelerated technique; charge coupling; gate-drain coupling capacitance measurement; test structure; CMOS process; Capacitance measurement; Capacitors; Charge measurement; Current measurement; Life estimation; MOSFET circuits; Parasitic capacitance; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on
Conference_Location :
Trento
Print_ISBN :
0-7803-2783-7
Type :
conf
DOI :
10.1109/ICMTS.1996.535621
Filename :
535621
Link To Document :
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