• DocumentCode
    2711849
  • Title

    Test structure to measure the gate-drain coupling capacitor using accelerated techniques

  • Author

    Manku, T.

  • Author_Institution
    Tech. Univ. Nova Scotia, Halifax, NS, Canada
  • fYear
    1996
  • fDate
    25-28 Mar 1996
  • Firstpage
    51
  • Lastpage
    53
  • Abstract
    In this paper, we present a test structure to measure the gate-drain coupling capacitance. The test structure has been implemented within a standard CMOS process. The structure uses charge coupling as a means to measure the gate-drain capacitance. Furthermore, the test structure can measure the gate-drain capacitance is less that 10 ms. The basic structure consists of two MOS transistors connected by their gates
  • Keywords
    MOSFET; capacitance measurement; semiconductor device testing; 10 ms; CMOS process; MOS transistor; accelerated technique; charge coupling; gate-drain coupling capacitance measurement; test structure; CMOS process; Capacitance measurement; Capacitors; Charge measurement; Current measurement; Life estimation; MOSFET circuits; Parasitic capacitance; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on
  • Conference_Location
    Trento
  • Print_ISBN
    0-7803-2783-7
  • Type

    conf

  • DOI
    10.1109/ICMTS.1996.535621
  • Filename
    535621