Universal surfaces for the accurate contact resistivity extraction on Kelvin structures with upper and lower resistive layers

Author

Santander, J. ; Lozano, M. ; Götz, A. ; Cané, C. ; Lora-Tamayo, E.

Author_Institution

Centro Nacional de Microelectronica, Univ. Autonoma de Barcelona, Spain

fYear

1996

fDate

25-28 Mar 1996

Firstpage

67

Lastpage

74

Abstract

An accurate procedure to extract contact resistivity from contact resistance measurements made on both D-Resistor and L-Resistor type Kelvin cross test structures with both upper and lower resistive layers is presented. The method is based on the obtention of a set of “Universal Surfaces” through computer simulation. Using adimensional variables these surfaces can be employed in all experimental conditions, eliminating the need of further simulations

Keywords

contact resistance; electric resistance measurement; D-Resistor; Kelvin cross test structure; L-Resistor; adimensional variables; computer simulation; contact resistance measurement; contact resistivity; resistive layer; universal surface; Computer simulation; Conductivity; Contact resistance; Geometry; Kelvin; Laplace equations; Resistors; Solid modeling; Surface resistance; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on

Conference_Location

Trento

Print_ISBN

0-7803-2783-7

Type

conf

DOI

10.1109/ICMTS.1996.535623

Filename

535623