DocumentCode :
2712893
Title :
A study of device performance on the effects of integrating photodiode onto CMOS technology
Author :
Zoolfakar, A.S. ; Ibrahim, Ziadora ; Zakaria, A.
Author_Institution :
Fac. of Electr. Eng., Univ. Teknol. MARA (UiTM), Shah Alam, Malaysia
Volume :
2
fYear :
2009
fDate :
4-6 Oct. 2009
Firstpage :
877
Lastpage :
880
Abstract :
The execution of this research is to investigate the effects of integrating photodiode onto 0.5 ¿m and 0.35 ¿m CMOS process technology. The research was carried out by using SILVACO software tool. The device performance and electrical properties are observed and analyzed. It can be conclude that the integration of photodiode onto CMOS technology resulted detrimental effect to the electrical characteristic of the device. However, the negative effect can be resolved by optimizing the threshold voltage adjust implantation module. On the contrary, the existence of photodiode resulted in a constructive manner for the breakdown voltage of NMOS technology.
Keywords :
CMOS integrated circuits; electric breakdown; electric properties; electronic engineering computing; photodiodes; software tools; CMOS technology; NMOS technology; SILVACO software tool; breakdown voltage; device performance; electrical characteristic; electrical property; integrating photodiode; size 0.35 micron; size 0.5 micron; threshold voltage adjust implantation module; CMOS process; CMOS technology; Electric variables; Fabrication; Industrial electronics; MOS devices; Photodiodes; Semiconductor device modeling; Thermal factors; Threshold voltage; breakdown voltage; photodiode and gate oxide thickness; saturation current; threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics & Applications, 2009. ISIEA 2009. IEEE Symposium on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4244-4681-0
Electronic_ISBN :
978-1-4244-4683-4
Type :
conf
DOI :
10.1109/ISIEA.2009.5356347
Filename :
5356347
Link To Document :
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