DocumentCode :
271293
Title :
55 dB DC gain, robust to PVT single-stage fully differential amplifier on 45 nm SOI-CMOS technology
Author :
Gómez, H. ; Espinosa, G.
Author_Institution :
Dept. of Electron. Eng., UNISANGIL, San Gil, Colombia
Volume :
50
Issue :
10
fYear :
2014
fDate :
May 8 2014
Firstpage :
737
Lastpage :
739
Abstract :
The design of a single-stage operational transconductance amplifier is presented, which uses self-cascode transistors and current shunt stages to improve its DC gain. The proposed amplifier is implemented in a standard 45 nm silicon on insulator CMOS process. Simulation results show that the amplifier has a DC gain above 50 dB despite physical and environmental variations with a minimum gain bandwidth product of 540 MHZ and more than 55° phase margin. In addition, the simulated transient behaviour is shown to be robust, with a slew rate of 500 V/μs and a settling time of 7 ns with 1% accuracy for a CL of 0.3 pF.
Keywords :
CMOS analogue integrated circuits; UHF amplifiers; UHF integrated circuits; differential amplifiers; elemental semiconductors; integrated circuit design; operational amplifiers; silicon; silicon-on-insulator; GBW product; PM; PVT single-stage fully differential amplifier; SOI-CMOS technology; SR; Si; bandwidth 540 MHz; capacitance 0.3 pF; current shunt stage; gain 55 dB; minimum gain bandwidth product; phase margin; self-cascode transistor; silicon on insulator; simulated transient behaviour; single-stage operational transconductance amplifier; size 45 nm; slew rate; time 7 ns;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2014.0883
Filename :
6824045
Link To Document :
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