Title :
Property comparison between tantalum and tungsten doped polycrystalline VO2 thin films
Author :
Jinhua, Li ; Daohua, Zhang ; Yan, Wang ; Meng, Zhao ; Weifeng, Zheng ; Ningyi, Yuan
Author_Institution :
Dept of Electr. & Electron. Eng., Jiangsu Polytech. Univ., Changzhou
Abstract :
Vanadium dioxide films doped tantalum and tungsten were deposited on SiO2/Si substrate by modified Ion Beam Enhanced Deposition (IBED) method. The doped polycrystalline VO2 films have single (002) orientation. The phase transition temperature was 28degC and 42degC for W and Ta doping respectively. The TCR was -3.4%/K and -10.14%/K at 300 K for V0.97W0.03O2 and V0.97Ta0.03O2 respectively. Experimental results shown the crystal lattice constant d was elongated about 0.34% and 0.24%, phase transition hysteresis was 2.1degC and 1.2degC, the resistivity change magnitude was 1.6 and 1.2 for W-and W-and W-and Ta-doped IBED VO2 films respectively.
Keywords :
crystal structure; doping; electrical conductivity transitions; electrical resistivity; hysteresis; insulating thin films; ion beam assisted deposition; lattice constants; semiconductor thin films; tantalum; tungsten; vanadium compounds; SiO2-Si; VO2:Ta; VO2:W; crystal lattice constant; doping; ion beam enhanced deposition method; phase transition hysteresis; phase transition temperature; resistivity change magnitude; single (002) orientation; tantalum doped polycrystalline vanadium dioxide thin films; tungsten doped polycrystalline vanadium dioxide thin films; Atomic force microscopy; Doping; Ion beams; Optical films; Powders; Scanning electron microscopy; Sputtering; Substrates; Transistors; Tungsten;
Conference_Titel :
PhotonicsGlobal@Singapore, 2008. IPGC 2008. IEEE
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-3901-0
Electronic_ISBN :
978-1-4244-2906-6
DOI :
10.1109/IPGC.2008.4781361