Title :
Fabrication of Tunable Duty Cycle Metal Wire Nanograting by Oblique Sputtering
Author :
Zhang, L. ; Teng, J.H. ; Ang, N.S.S. ; Chew, A.B. ; Chua, S.J.
Author_Institution :
Singapore-MIT Alliance, Singapore
Abstract :
A method to fabricate metal wire nanogratings of tunable duty cycle (0.5~0.9 and even larger) without using e-beam lithography (EBL) is demonstrated. This provides a low cost technology to realize subwavelength metal slit arrays. The fabrication processes and the details of accurately controlling the grating shape are disclosed. The transmission properties of the metal wire nanograting with different duty cycles are discussed. The technique to make multiple layer metal wire grating using oblique deposition is also proposed.
Keywords :
diffraction gratings; nanofabrication; nanophotonics; nanowires; optical arrays; optical fabrication; optical materials; optical multilayers; optical tuning; sputtering; surface plasmon resonance; grating shape control; metal wire nanograting fabrication; multiple layers grating structure; oblique deposition; oblique sputtering; subwavelength metal slit array; surface plasmon resonance; tunable duty cycle; Costs; Fabrication; Gratings; Lithography; Optical devices; Plasmons; Resonance; Shape control; Sputtering; Wire; e-beam lithography; metal grating; nano grating; oblique sputtering; surface plasmon resonance (SPR);
Conference_Titel :
PhotonicsGlobal@Singapore, 2008. IPGC 2008. IEEE
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-3901-0
Electronic_ISBN :
978-1-4244-2906-6
DOI :
10.1109/IPGC.2008.4781365
