• DocumentCode
    2716186
  • Title

    A novel process for alkoxide-derived PZT thin films with multi-seeding layers

  • Author

    Othman, M. Baijuri ; Suzuki, H. ; Murakami, K. ; Kaneko, S. ; Hayashi, T.

  • Author_Institution
    Dept. of Mater. Sci. Tech., Shizuoka Univ., Hamamatsu, Japan
  • Volume
    2
  • fYear
    1996
  • fDate
    18-21 Aug 1996
  • Firstpage
    731
  • Abstract
    An improved method using molecular-designed metal alkoxide precursors is described for the sol-gel process of lead zirconate titanate (PZT) thin film. This method involves the insertion of film of perovskite lead titanate (PT) as a seeding layer between each PZT layers, which offers the nucleation sites reducing the activation energy for the crystallization, and leads to highly crystalline PZT film. An intermediate pyrochlore phase occurred in the deposited film by the annealing at around 400°C in air, and then was completely converted to the perovskite phase at a low temperature of 450°C. The relative permittivity of the resulting film annealed at 450°C increased with increasing film thickness. As a result, it reached a value of 346 at 1.8 μm
  • Keywords
    annealing; ferroelectric thin films; lead compounds; nucleation; permittivity; piezoceramics; sol-gel processing; 400 to 450 C; PT multi-seeding layer; PZT; PZT thin film; PbZrO3TiO3; activation energy; annealing; crystallization; metal alkoxide precursor; molecular design; nucleation; permittivity; perovskite phase; pyrochlore phase; sol-gel process; Annealing; Crystallization; Ferroelectric films; Lead; Permittivity; Piezoelectric films; Sputtering; Temperature; Titanium compounds; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 1996. ISAF '96., Proceedings of the Tenth IEEE International Symposium on
  • Conference_Location
    East Brunswick, NJ
  • Print_ISBN
    0-7803-3355-1
  • Type

    conf

  • DOI
    10.1109/ISAF.1996.598128
  • Filename
    598128