DocumentCode
2716186
Title
A novel process for alkoxide-derived PZT thin films with multi-seeding layers
Author
Othman, M. Baijuri ; Suzuki, H. ; Murakami, K. ; Kaneko, S. ; Hayashi, T.
Author_Institution
Dept. of Mater. Sci. Tech., Shizuoka Univ., Hamamatsu, Japan
Volume
2
fYear
1996
fDate
18-21 Aug 1996
Firstpage
731
Abstract
An improved method using molecular-designed metal alkoxide precursors is described for the sol-gel process of lead zirconate titanate (PZT) thin film. This method involves the insertion of film of perovskite lead titanate (PT) as a seeding layer between each PZT layers, which offers the nucleation sites reducing the activation energy for the crystallization, and leads to highly crystalline PZT film. An intermediate pyrochlore phase occurred in the deposited film by the annealing at around 400°C in air, and then was completely converted to the perovskite phase at a low temperature of 450°C. The relative permittivity of the resulting film annealed at 450°C increased with increasing film thickness. As a result, it reached a value of 346 at 1.8 μm
Keywords
annealing; ferroelectric thin films; lead compounds; nucleation; permittivity; piezoceramics; sol-gel processing; 400 to 450 C; PT multi-seeding layer; PZT; PZT thin film; PbZrO3TiO3; activation energy; annealing; crystallization; metal alkoxide precursor; molecular design; nucleation; permittivity; perovskite phase; pyrochlore phase; sol-gel process; Annealing; Crystallization; Ferroelectric films; Lead; Permittivity; Piezoelectric films; Sputtering; Temperature; Titanium compounds; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1996. ISAF '96., Proceedings of the Tenth IEEE International Symposium on
Conference_Location
East Brunswick, NJ
Print_ISBN
0-7803-3355-1
Type
conf
DOI
10.1109/ISAF.1996.598128
Filename
598128
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