DocumentCode
2720285
Title
A total TCAD environment for DFM
Author
Newsam, M.I. ; Fallon, M. ; Walton, A.J.
Author_Institution
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear
1995
fDate
34801
Firstpage
42370
Lastpage
42373
Abstract
This paper presents an integrated software environment that is used as part of a Design For Manufacturability (DFM) procedure. The software allows users to integrate simulation software with statistical analysis, incorporating Design Of Experiments (DOE) and contour plots. Techniques for investigating process variations are included allowing the process designer to choose the optimum processing conditions, and set realistic specifications on the process parameters
Keywords
circuit CAD; design for manufacture; design of experiments; integrated circuit design; integrated circuit manufacture; semiconductor process modelling; statistical analysis; DFM; Design For Manufacturability; Design Of Experiments; TCAD; contour plots; integrated software; process design; simulation; statistical analysis;
fLanguage
English
Publisher
iet
Conference_Titel
Improving the Efficiency of IC Manufacturing Technology, IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19950923
Filename
478204
Link To Document