Title :
Novel interconnect methodologies for ultra-thin chips on foils
Author :
Sridhar, A. ; Cauwe, M. ; Fledderus, H. ; Kusters, R.H.L. ; van den Brand, J.
Author_Institution :
Holst Centre, TNO, Eindhoven, Netherlands
fDate :
May 29 2012-June 1 2012
Abstract :
Reliable interconnection technology is key to the realization of reliable hybrid microelectronic systems that combine printed electronics and silicon technology. Flexible hybrid electronic systems-in-foil (SiF) that are typically suited for roll-to-roll (R2R) manufacturing place additional requirements and demands on interconnects. In this paper, three novel interconnection methodologies for SiF are compared for a novel face-up integration approach for ultra-thin chip on foil. Laser scribing, inkjet printing and laser-induced forward transfer (LIFT) are the technologies compared with each other, as well as with electroplating, a standard technology widely used in the electronics industry. The comparison is based on experimental investigation into via filling, interconnect deposition, electrical conductivity and interconnect reliability. The selection of an interconnection technology for practical implementation is the key outcome of this paper.
Keywords :
electrical conductivity; electroplating; elemental semiconductors; flexible electronics; ink jet printing; integrated circuit interconnections; integrated circuit reliability; laser beam applications; silicon; thin films; LIFT; R2R manufacturing; Si; SiF; electrical conductivity; electronics industry; electroplating; face-up integration approach; flexible hybrid electronic systems-in-foil; hybrid microelectronic systems; inkjet printing; interconnect deposition; interconnect methodology; interconnect reliability; laser scribing; laser-induced forward transfer; printed electronics; roll-to-roll manufacturing; silicon technology; ultrathin chips; Copper; Filling; Integrated circuit interconnections; Lasers; Materials; Printing; Silver;
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4673-1966-9
Electronic_ISBN :
0569-5503
DOI :
10.1109/ECTC.2012.6248834