Title :
193nm photolytic mechanism in Er/Al doped silica
Author :
Groothoff, N. ; Lancry, M. ; Poumellec, B. ; Canning, J.
Author_Institution :
Sch. of Chem., Sydney Univ., Sydney, NSW
Abstract :
The photolytic mechanism in erbium/ aluminium doped silica preform was determined to be two-photon absorption. Index change, determined from diffraction efficiency, primarily occurred through material densification, which is supported by additional nanometre scale surface analysis.
Keywords :
aluminium; densification; erbium; photolysis; refractive index; silicon compounds; two-photon processes; SiO2:Al,Er; densification; diffraction efficiency; erbium-aluminium doped silica; nanometre scale surface analysis; photolytic mechanism; two-photon absorption; wavelength 193 nm; Aluminum; Bragg gratings; Erbium; Optical fibers; Optical interferometry; Optical materials; Phase shifting interferometry; Preforms; Silicon compounds; Surface topography;
Conference_Titel :
Opto-Electronics and Communications Conference, 2008 and the 2008 Australian Conference on Optical Fibre Technology. OECC/ACOFT 2008. Joint conference of the
Conference_Location :
Sydney
Print_ISBN :
978-0-85825-807-5
Electronic_ISBN :
978-0-85825-807-5
DOI :
10.1109/OECCACOFT.2008.4610326
