DocumentCode
2721914
Title
Semiconductor Manufacturing Technology in the 21st Century
Author
Iwai, Hiroshi
Author_Institution
Frontier Collaborative Res. Center, Tokyo Inst. of Technol., Yokohama
fYear
2006
fDate
24-26 April 2006
Firstpage
1
Lastpage
17
Abstract
This paper focuses on the future semiconductor manufacturing challenges. Some background information regarding the possible limits of scaling and the problems appeared in the sub-100 nm devices are discussed. The impacts of the future semiconductor manufacturing are discussed. We shall also look forward to the possible geographical redistribution of the manufacturing centers and the new role playing of the present leaders in IC technology. Paradigm of post-downsizing era is described
Keywords
integrated circuit manufacture; integrated circuit technology; IC technology; geographical redistribution; manufacturing centers; post-downsizing era; semiconductor manufacturing technology; Artificial intelligence; Electron tubes; Electronic circuits; High speed integrated circuits; Integrated circuit technology; Intelligent robots; MOSFETs; Semiconductor device manufacture; Silicon; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 2006 International Symposium on
Conference_Location
Hsinchu
ISSN
1524-766X
Print_ISBN
1-4244-0181-4
Electronic_ISBN
1524-766X
Type
conf
DOI
10.1109/VTSA.2006.251111
Filename
4016584
Link To Document