• DocumentCode
    2722008
  • Title

    Advanced flip-chip package solution for 28nm Si node and beyond

  • Author

    Liu, C.S. ; Chen, C.S. ; Lee, C.H. ; Tsai, H.Y. ; Pu, H.P. ; Cheng, M.D. ; Kuo, T.H. ; Chen, H.W. ; Wu, C.Y. ; Lii, M.J. ; Yu, Doug C H

  • Author_Institution
    R&D, Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
  • fYear
    2012
  • fDate
    May 29 2012-June 1 2012
  • Firstpage
    436
  • Lastpage
    438
  • Abstract
    Next generation flip chip package with <;100um fine bump pitch is developed in a cost effective Bump-on-Trace (BOT) package structure for 28nm Si technology node. This is foreseen to be a mainstream for mobile applications in next generations. The key challenges of this new technology include warpage control of molded underfill (MUF) for <; 4 mils of thin die, packaging yield due to finer pitch of bumping/substrate design and thermal/mechanical effect on chip-package-interaction (CPI) [1-2]. CPI due to the use of fragile extreme low-k (ELK) dielectric material in the back-end-of-line (BEOL) layers has been fully characterized. The well-integrated Si/bump/package processes enable reliable CPI and assembly yield. An aggressive and reliable Si/bump/package design and CPI approaches are also discussed.
  • Keywords
    elemental semiconductors; flip-chip devices; low-k dielectric thin films; reliability; silicon; BEOL layers; BOT package structure; CPI reliability; MUF; Si; advanced flip-chip package solution; back-end-of-line layers; bump pitch; bump-on-trace package structure; bumping-substrate design; chip-package-interaction; fragile ELK dielectric material; fragile extreme low-k material; mobile applications; molded underfill; next generation flip chip package; size 28 nm; thermal-mechanical effect; warpage control; Assembly; Flip chip; Joints; Reliability; Silicon; Stress; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4673-1966-9
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2012.6248867
  • Filename
    6248867