• DocumentCode
    2722010
  • Title

    P-channel SONOS Transient Current Modeling for Program and Erase

  • Author

    Du, Pei-Ying ; Guo, Jyh-Chyurn ; Lee, H.M. ; Chen, H.M. ; Shen, Rick ; Hsu, C.C.-H.

  • Author_Institution
    Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Rd, Hsinchu, Taiwan, R.O.C.
  • fYear
    2006
  • fDate
    38808
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Transient current models with time and field dependence are proposed. The time dependence follows asymptotic t-1 behavior with slower tunneling rate for erase (ERS) than program (PGM). The field dependence follows FN tunneling in higher field for PGM and intermediate field for ERS with relatively higher corner field for saturation. The models have been justified for P-channel SONOS (P-SONOS) with splits of ONO scheme.
  • Keywords
    CMOS technology; Dielectrics; Electron traps; Electronics industry; Energy states; Industrial electronics; Oxidation; SONOS devices; Threshold voltage; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 2006 International Symposium on
  • ISSN
    1524-766X
  • Print_ISBN
    1-4244-0181-4
  • Electronic_ISBN
    1524-766X
  • Type

    conf

  • DOI
    10.1109/VTSA.2006.251116
  • Filename
    4016589