• DocumentCode
    2724186
  • Title

    Sub-micron chip ESD protection schemes which avoid avalanching junctions

  • Author

    Worley, E.R. ; Gupta, R. ; Jones, B. ; Kjar, R. ; Nguyen, C. ; Tennyson, M.

  • Author_Institution
    Rockwell Telecommun., Newport Beach, CA, USA
  • fYear
    1995
  • fDate
    12-14 Sept. 1995
  • Firstpage
    13
  • Lastpage
    20
  • Abstract
    Because of leakage problems related to avalanche breakdown of salicided junctions, an array of ESD protection methods has been developed and tested which depend on forward biased diodes and normal MOSFET conduction. These methods include the case of multiple power supplies, the case where the pad voltage can exceed the power supply voltage, and the case where the pad voltage both exceeds the power supply voltage and the process voltage limit. These methods result in parts made in 0.8 and 0.6 /spl mu/m salicided technologies routinely passing our upper division spec. of /spl plusmn/4500 V HBM without any discernible increase in pin leakage. Also, split supply salicided parts pass 1 kV of CDM with no discernible pin leakage increase and 2 kV with pin leakage increase but within spec. (10 /spl mu/A).
  • Keywords
    electrostatic discharge; integrated circuit technology; leakage currents; monolithic integrated circuits; protection; 0.6 micron; 0.8 micron; 1 kV; 10 muA; 2 kV; ESD protection schemes; MOSFET conduction; forward biased diodes; multiple power supplies; pad voltage; pin leakage; salicided junctions; submicron chip protection; Avalanche breakdown; Diodes; Electrostatic discharge; MOSFET circuits; Power supplies; Protection; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1995
  • Conference_Location
    Phoenix, AZ, USA
  • Print_ISBN
    1-878303-59-7
  • Type

    conf

  • DOI
    10.1109/EOSESD.1995.478263
  • Filename
    478263