• DocumentCode
    2724738
  • Title

    Comparisons of noise spectroscopy analyze and microplasma noise sources

  • Author

    Vanek, J. ; Dolensky, J. ; Chobola, Z. ; Lunak, M.

  • Author_Institution
    Dept. of Electrotechnol., Brno Univ. of Technol., Brno, Czech Republic
  • fYear
    2010
  • fDate
    16-19 May 2010
  • Firstpage
    469
  • Lastpage
    473
  • Abstract
    As it was the mechanical noise used for diagnostic of machine in the past, the electronic noise can be used as diagnostic tool for detection defects in electronical devices and systems in the future. This paper deals with comparisons of noise spectroscopy and detection of microplasma noise sources in the three new type of solar cells G1, G3 and G5. When high electric is applied to PN junction with some technological imperfections like dislocation in PN junction or crystal-grid defect causing non-homogeneity of parameters it produces in tiny areas of enhanced impact ionization called microplasma. It can leads onwards to deterioration in quality or to destruction of PN junction. Microplasma produced noise, which has random spectrum in frequency range. Microplasma noise is measurable even before the creation of light emissions. Due to the comparisons microplasma detection with noise characteristic can full analyzed solar cell.
  • Keywords
    ionisation; p-n junctions; solar cells; PN junction; crystal-grid defect; detection defects; diagnostic tool; electronic noise; light emissions; microplasma noise source detection; noise spectroscopy; solar cells; Etching; Frequency; Impact ionization; Microelectronics; Photovoltaic cells; Semiconductor thin films; Silicon; Spectroscopy; Surface finishing; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Proceedings (MIEL), 2010 27th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    978-1-4244-7200-0
  • Type

    conf

  • DOI
    10.1109/MIEL.2010.5490442
  • Filename
    5490442