DocumentCode
2725212
Title
High-density capacitors with conformal high-k dielectrics on etched-metal foils
Author
Chakraborti, Parthasarathi ; Sharma, Himani ; Raj, P. Markondeya ; Tummala, Rao
Author_Institution
Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2012
fDate
May 29 2012-June 1 2012
Firstpage
1640
Lastpage
1643
Abstract
This paper describes the fabrication and characterization of high-density capacitors using etched-metal foils as high-surface area electrodes. High permittivity films were conformally-formed over the metal foils using an anodization reaction. The approach was demonstrated with two material systems, viz., etched aluminum foils and porous titanium foils. Both the metal anodizations were carried out with aqueous solution of citric acid as electrolytes. The electrical properties of the etched-foil capacitor were measured using a sulfuric acid solution as the top contact. The high surface area electrodes yielded very high capacitance densities of 35-40 μF/cm2.
Keywords
aluminium; capacitors; etching; semiconductor device manufacture; titanium; Al; Ti; anodization reaction; aqueous solution; citric acid; conformal high-k dielectrics; electrolytes; etched-metal foils; high permittivity films; high-density capacitors; high-surface area electrodes; sulfuric acid solution; Aluminum; Capacitance; Capacitors; Electrodes; Surface treatment; Titanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
978-1-4673-1966-9
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2012.6249057
Filename
6249057
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