• DocumentCode
    2725647
  • Title

    Aspects of scaling to mesoscale models derived from the molecular scale for understanding epoxy interfaces

  • Author

    Iwamoto, Nancy

  • Author_Institution
    Honeywell Performance Materials and Technologies
  • fYear
    2012
  • fDate
    May 29 2012-June 1 2012
  • Firstpage
    1774
  • Lastpage
    1780
  • Abstract
    Model scaling from the atomistic level up in order to address performance issues is a topic of increasing interest. One type of scaling that is being investigated is a jump from the molecular scale (angstrom scale) to the submicron mesoscale model. Since both are particle methods, the scaling is a simple one of re-definition and re-parameterization of the particle interaction. This paper will cover aspects of the parameterization that we have found to be useful to allow scaling to the mesoscale and the subsequent mechanical response of the copper/epoxy adhesive interface, of practical interest in molding compounds. The maximum scaling achieved has been from the nanometer to submicron scales for an epoxy (increasing the formula weight in the crosslinked epoxy model by a factor of 500-1000). Obtaining larger models is possible with size limitations due to the computer resources available. Investigations in handling mesoscale models to address interface density, crosslinking effects, and roughness will be discussed.
  • Keywords
    adhesion; adhesives; copper; moulding; resins; scaling phenomena; Cu; address interface density; angstrom scale; atomistic level up; computer resources; copper/epoxy adhesive interface; crosslinked epoxy; crosslinking effects; model scaling; molding compounds; molecular scale; parameterization; particle interaction; particle methods; submicron mesoscale model; subsequent mechanical response; Computational modeling; Copper; Deformable models; Dielectrics; Plastics; Strain;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4673-1966-9
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2012.6249078
  • Filename
    6249078