• DocumentCode
    2726160
  • Title

    Perspective on Power IC technology: From design lab to wafer fab

  • Author

    Igic, P. ; Elwin, M.P. ; Holland, P.M.

  • Author_Institution
    Sch. of Eng., Swansea Univ., Swansea, UK
  • fYear
    2010
  • fDate
    16-19 May 2010
  • Firstpage
    73
  • Lastpage
    77
  • Abstract
    A case study regarding development of a 100V Power IC technology is presented in this paper. A combination of conventional cross sectional process and device simulations combined with top down and 3D device simulations have been used to design and optimise the integration of a 100V Lateral DMOS (LDMOS) device for high side bridge applications. This combined simulation approach can streamline the device design process and gain important information about end effects which are lost from 2D cross sectional simulations. Design solutions to negate detrimental end effects are proposed and optimised by top down and 3D simulations and subsequently proven on tested silicon. Different electrical isolation schemes have also been investigated.
  • Keywords
    CMOS integrated circuits; circuit simulation; integrated circuit design; power integrated circuits; 2D cross sectional simulation; 3D device simulation; design lab; device design process; high side bridge application; lateral DMOS; power IC technology; wafer fab; CMOS technology; Consumer electronics; Costs; Design optimization; Isolation technology; Manufacturing processes; Power integrated circuits; Power transistors; Silicon on insulator technology; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Proceedings (MIEL), 2010 27th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    978-1-4244-7200-0
  • Type

    conf

  • DOI
    10.1109/MIEL.2010.5490529
  • Filename
    5490529