• DocumentCode
    2727366
  • Title

    Thin-film materials for SAW devices

  • Author

    Hickernell, Fred S.

  • Author_Institution
    Motorola Inc., Scottsdale, AZ, USA
  • fYear
    1989
  • fDate
    3-6 Oct 1989
  • Firstpage
    285
  • Abstract
    The status of thin films for SAW (surface acoustic wave) devices is reviewed through the framework of a process-structure-property network commonly considered in the thin-film area. Different branches of this network are considered and practical examples from SAW thin films illustrate the nature of these relationships. Such considerations lead to a better understanding of thin-film nucleation and growth processes and the deposition parameters that result in the best microstructures for SAW devices. The discussion is limited to the physical vacuum-deposition processes of thermal evaporation and sputtering, which traditionally have been the most commonly used SAW thin-film processes. Such depositions can be made at relatively low substrate temperatures. The present directions of thin-film research and how they may affect future SAW device developments are considered
  • Keywords
    piezoelectric thin films; sputtered coatings; surface acoustic wave devices; vacuum deposited coatings; SAW thin films; deposition parameters; growth processes; microstructures; piezoelectric film; process-structure-property network; sputtering; substrate temperatures; surface acoustic wave devices; thermal evaporation; thin-film nucleation; vacuum-deposition processes; Aluminum; Delay lines; Electrodes; Piezoelectric films; Semiconductor films; Sputtering; Substrates; Surface acoustic wave devices; Surface acoustic waves; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 1989. Proceedings., IEEE 1989
  • Conference_Location
    Montreal, Que.
  • Type

    conf

  • DOI
    10.1109/ULTSYM.1989.66996
  • Filename
    66996