DocumentCode
2728029
Title
An impact of process variation on supply voltage dependence of logic path delay variation
Author
Nishizawa, Shinichi ; Ishihara, Tohru ; Onodera, Hidetoshi
Author_Institution
Grad. Sch. of Inf., Kyoto Univ., Kyoto, Japan
fYear
2015
fDate
27-29 April 2015
Firstpage
1
Lastpage
4
Abstract
Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.
Keywords
CMOS analogue integrated circuits; CMOS logic circuits; delay circuits; logic gates; oscillators; CMOS process; DVFS technique; dynamic voltage and frequency scaling technique; logic gate; logic path delay variation; ring oscillator circuit; size 65 nm; supply voltage dependence; Delays; Frequency measurement; Logic gates; Oscillators; Sensitivity; Transistors; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, Automation and Test (VLSI-DAT), 2015 International Symposium on
Conference_Location
Hsinchu
Type
conf
DOI
10.1109/VLSI-DAT.2015.7114534
Filename
7114534
Link To Document