• DocumentCode
    2728029
  • Title

    An impact of process variation on supply voltage dependence of logic path delay variation

  • Author

    Nishizawa, Shinichi ; Ishihara, Tohru ; Onodera, Hidetoshi

  • Author_Institution
    Grad. Sch. of Inf., Kyoto Univ., Kyoto, Japan
  • fYear
    2015
  • fDate
    27-29 April 2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.
  • Keywords
    CMOS analogue integrated circuits; CMOS logic circuits; delay circuits; logic gates; oscillators; CMOS process; DVFS technique; dynamic voltage and frequency scaling technique; logic gate; logic path delay variation; ring oscillator circuit; size 65 nm; supply voltage dependence; Delays; Frequency measurement; Logic gates; Oscillators; Sensitivity; Transistors; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Design, Automation and Test (VLSI-DAT), 2015 International Symposium on
  • Conference_Location
    Hsinchu
  • Type

    conf

  • DOI
    10.1109/VLSI-DAT.2015.7114534
  • Filename
    7114534