• DocumentCode
    2729203
  • Title

    Future of Nano-CMOS Technology and Its Production

  • Author

    Iwai, Hiroshi

  • Author_Institution
    Frontier Collaborative Res. Center, Tokyo Inst. of Technol., Yokohama
  • fYear
    2006
  • fDate
    3-7 July 2006
  • Firstpage
    1
  • Lastpage
    17
  • Abstract
    This paper focuses on the future semiconductor manufacturing challenges. Some background information regarding the possible limits of scaling and the problems appeared in the sub-100 nm devices will be discussed, respectively, in section 2 and 3. The impacts of the future semiconductor manufacturing will be discussed in section 4. We shall also look forward to the possible geographical redistribution of the manufacturing centers and the new role playing of the present leaders in IC technology. Paradigm of post-downsizing era will be described in section 5
  • Keywords
    nanotechnology; semiconductor device manufacture; IC technology; nano-CMOS technology; semiconductor manufacturing; Electron tubes; Electronic circuits; Intelligent robots; Intelligent sensors; Large scale integration; MOSFETs; Production; Silicon; Transistors; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
  • Conference_Location
    Singapore
  • Print_ISBN
    1-4244-0205-0
  • Electronic_ISBN
    1-4244-0206-9
  • Type

    conf

  • DOI
    10.1109/IPFA.2006.250988
  • Filename
    4017013