CrossBeam, Principles and Application

The use of the focused ion beam (FIB) systems has increased to a high level in recent years. The imaging, milling, and deposition capabilities of the FIB make it the ideal instrument for e. g. site-specific failure analysis, specimen preparation and nano-machining. Ion channelling contrast allows for selective imaging of polycrystalline and poly-phase microstructures. In addition, the FIB and CrossBeamreg instruments are unique stand-alone analytical tools. Their vast capabilities have enabled numerous applications into the semiconductor and materials sciences applications. These integrated CrossBeamreg tools enable the observation and direct control of the FIB operation in real time. In addition to the improved accuracy and resolution the electron beam adds analytical capabilities as STEM, EDS and EBSP to the instruments.