Large-Area Arrays of Pillar-Based Metal Nanostructures

The fabrication method of metal nanostructure arrays on large-area (e.g., 4" in diameter) substrate is proposed and demonstrated. The method includes formation of self-organized mask, nanopillar preparation by reactive ion etching, and oblique angle metal deposition on the nanopillar sidewalls. The resulting structures have crescent shapes with controllable opening, thickness, diameter, and height. Due to geometrical asymmetry, the nanocrescents demonstrate anisotropy of optical properties and can be used in production of cheap and large-area metamaterials.