• DocumentCode
    2729395
  • Title

    Non-Classical Hot-Electron Gate Current in the Deep Submicrometer N-MOS Flash Memory Cell

  • Author

    Zhang, Y. ; Ang, D.S. ; Kuan, H.P. ; Tan, K.T.

  • Author_Institution
    Microelectron. Centre, Nanyang Technol. Univ., Singapore
  • fYear
    2006
  • fDate
    3-7 July 2006
  • Firstpage
    75
  • Lastpage
    79
  • Abstract
    In this paper, experimental features of a non-classical hot-electron gate current Ig e obtained under Vb = 0, similar to those reported earlier under reverse Vb are presented. To the best of our knowledge, this is the first direct observation of this non-classical Ig e component in deep submicrometer N-channel MOSFET under conventional CHE biasing, i.e. when Vg ap Vd and Vb = 0. Based on the results, a phenomenological explanation as well as some further supporting experimental evidence is also presented here
  • Keywords
    MOSFET; flash memories; hot carriers; CHE biasing; deep submicrometer N-MOS flash memory cell; nonclassical hot-electron gate current; Channel hot electron injection; Charge carrier processes; Feedback; Flash memory cells; Heating; Impact ionization; MOSFET circuits; Nonvolatile memory; Substrate hot electron injection; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
  • Conference_Location
    Singapore
  • Print_ISBN
    1-4244-0205-0
  • Electronic_ISBN
    1-4244-0206-9
  • Type

    conf

  • DOI
    10.1109/IPFA.2006.251001
  • Filename
    4017026