Title :
Alternate Conductive Atomic Force Microscope with Scanning Capacitance Microscope to Catch Hidden Defect
Author :
Chuang, T.C. ; Shen, C.M. ; Lin, S.C. ; Chou, J.H.
Author_Institution :
Taiwan Semicond. Manuf. Co., Ltd., Tainan
Abstract :
This paper described how to use conductive atomic force microscope (C-AFM) and scanning capacitance microscope (SCM) alternately to catch very tiny and cunning defect modes hidden in the indiscernible corner. These schemes are easily implemented with standard equipment already present in most failure analysis laboratories, and could overcome some encountered judge problems
Keywords :
atomic force microscopy; doping profiles; failure analysis; integrated circuit reliability; integrated circuit testing; conductive atomic force microscope; failure analysis; hidden defects; scanning capacitance microscope; Atomic force microscopy; CMOS logic circuits; Capacitance; Failure analysis; Implants; Scanning electron microscopy; Semiconductor device manufacture; Signal processing; Surface topography; Voltage;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
1-4244-0205-0
Electronic_ISBN :
1-4244-0206-9
DOI :
10.1109/IPFA.2006.251032
