High quality erbium doped tellurite glass films using ultrafast laser deposition

Ultrafast laser ablation has been used successfully to grow glass thin films from bulk glass targets. The laser frequency, laser energy, process gas pressure, substrate temperature, substrate distance and substrate temperature where optimized to obtain highly transparent glass films of Er³⁺-doped tellurite glass. An empirical approach was followed to optimize the deposition parameters for the film fabrication. The ultrafast laser ablation procedure developed in the present work to fabricate oxide glass films would certainly overcome many deficiencies of the existing methods in producing high optical quality required photonic applications.