DocumentCode :
2730858
Title :
Application of the latency insertion method (LIM) to the modeling of CDM ESD events
Author :
Klokotov, Dmitri ; Shukla, Vrashank ; Schutt-Ainé, José ; Rosenbaum, Elyse
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
fYear :
2010
fDate :
1-4 June 2010
Firstpage :
652
Lastpage :
656
Abstract :
In this paper, the application of the latency insertion method (LIM) to the analysis of charged device model (CDM) electrostatic discharge (ESD) events in integrated circuits (ICs) is discussed. LIM is proposed as an alternative to existing techniques commonly used for chip-level circuit simulation of CDM ESD. Such simulators, based on the modified nodal analysis (MNA) method, can underperform in cases that require very large model sizes. LIM was developed specifically for the analysis of fast transient phenomena in very large networks and is more robust and less resource-hungry than conventional methods.
Keywords :
Biological system modeling; Circuit simulation; Circuit testing; Conducting materials; Delay; Electrostatic discharge; Integrated circuit modeling; Semiconductor device manufacture; Substrates; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
Conference_Location :
Las Vegas, NV, USA
ISSN :
0569-5503
Print_ISBN :
978-1-4244-6410-4
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2010.5490800
Filename :
5490800
Link To Document :
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