DocumentCode :
2731308
Title :
A Comparative Study on the Soft-Error Rate of Flip-Flops from 90-nm Production Libraries
Author :
Heijmen, Tino ; Roche, Philippe ; Gasiot, Gilles ; Forbes, Keith R.
Author_Institution :
Philips Res. Labs., Eindhoven
fYear :
2006
fDate :
26-30 March 2006
Firstpage :
204
Lastpage :
211
Abstract :
This paper presents a study using alpha- and neutron-accelerated tests to characterize soft error rates (SER) of flip-flops that are used in 90-nm CMOS production designs. The investigated flip-flops differ in circuit schematic, VT, drive strength, and cell height. Both the alpha- and the neutron-induced SER of flip-flops on a dedicated 90-nm test-chip showed a strong dependency on clock and data state. A strong VDD-saturation effect was observed for the alpha-SER under certain operational conditions. Modeling results show that the impact of process variations on flip-flop SER strongly depends on the data state. On average, the SER per bit of the investigated flip-flops is higher than the typical SER per bit of unprotected SRAMs in 90-nm. This observation and the large variation found in the flip-flop results illustrate the importance of SER characterization in order to design reliable integrated circuits
Keywords :
CMOS integrated circuits; alpha-particle effects; flip-flops; integrated circuit design; integrated circuit reliability; nanotechnology; neutron effects; product design; 90 nm; CMOS production designs; FDD-saturation effect; SRAM; alpha-accelerated tests; circuit schematic; flip-flops; integrated circuits design; integrated circuits reliability; neutron-accelerated tests; production libraries; soft-error rate; Circuit testing; Clocks; Error analysis; Flip-flops; Integrated circuit reliability; Latches; Libraries; Neutrons; Production; Semiconductor device measurement; 90-nm process; SER; accelerated test; alpha-particles; filp-flops; neutrons; process variations; radiation; sequential; soft error rate;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2006. 44th Annual., IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9498-4
Electronic_ISBN :
0-7803-9499-2
Type :
conf
DOI :
10.1109/RELPHY.2006.251218
Filename :
4017159
Link To Document :
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