Title :
Fine pitch chip interconnection technology for 3D integration
Author :
Hwang, Jihwan ; Kim, Jongyeon ; Kwon, Woonseong ; Kang, Unbyoung ; Cho, Taeje ; Kang, Sayoon
Author_Institution :
Samsung Electron. Co., Ltd., Yongin, South Korea
Abstract :
3D-IC packaging using through silicon via technology has been extensively developed to meet small form factor and low power consumption for next generation devices. For 3D chip integration, a robust micro-joining technology is required to stack Si chips, which usually offer high I/O pin counts to achieve better electrical performance. As for the 3D chip stacking methodology, chip-on-wafer bonding is expected to have higher yield than chip-on-chip or wafer-on-wafer bonding. In the case of chip-on-chip bonding, the large amount of bottom chip warpage induced by the printed circuit board during bonding causes a serious drop in the joining yield. Wafer-on-wafer bonding is limited by lower cumulative yield even though the throughput is very high. In this study, the chip-on-wafer bonding method is used for 3D chip stacking, and the 40um pitch interconnection technology is developed. Both fluxless thermo-compression and conventional flip chip bonding technique were adopted and evaluated for chip-on-wafer bonding. By optimizing the bonding conditions, the good bondability and electrical connections were achieved regardless of bonding technique.
Keywords :
Energy consumption; Integrated circuit interconnections; Packaging; Printed circuits; Robustness; Silicon; Stacking; Three-dimensional integrated circuits; Throughput; Wafer bonding;
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
978-1-4244-6410-4
Electronic_ISBN :
0569-5503
DOI :
10.1109/ECTC.2010.5490821