DocumentCode
2731572
Title
Lifetime Enhancement under High Frequency NBTI measured on Ring Oscillators
Author
Nigam, Tanya ; Harris, E.B.
Author_Institution
Cypress Semicond., San Jose, CA
fYear
2006
fDate
26-30 March 2006
Firstpage
289
Lastpage
293
Abstract
In this paper, we studied the frequency degradation of ring oscillators (ROs) fabricated using 130nm technology. We demonstrate that for ROs operating at high temperatures in the frequency-range of 100MHz to 3GHz, Negative bias temperature instability (NBTI) is the dominant frequency degradation mechanism. The NBTI-lifetime measured on ROs is 4 decades longer than that of DC-stressed devices. A recovery of RO frequency is observed when stress is reduced, similar to stress relaxation in DC stress mode. Based on RO degradation data measured up to 3 GHz, we conclude that for circuits operating in a continuous switching mode, NBTI will not be a show stopper
Keywords
circuit reliability; circuit stability; oscillators; stress relaxation; 0.1 to 3 GHz; 130 nm; DC stress mode; continuous switching mode; frequency degradation; lifetime enhancement; negative bias temperature instability; ring oscillators; stress relaxation; Degradation; Frequency measurement; Niobium compounds; Nitrogen; Ring oscillators; Stress; Switches; Switching circuits; Switching frequency; Titanium compounds; NBTI; Ring Oscillator; relaxation;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 2006. 44th Annual., IEEE International
Conference_Location
San Jose, CA
Print_ISBN
0-7803-9498-4
Electronic_ISBN
0-7803-9499-2
Type
conf
DOI
10.1109/RELPHY.2006.251230
Filename
4017171
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