• DocumentCode
    2731625
  • Title

    Flash Memory Field Failure Mechanisms

  • Author

    Muroke, Pekka

  • Author_Institution
    Nokia Corp.
  • fYear
    2006
  • fDate
    26-30 March 2006
  • Firstpage
    313
  • Lastpage
    316
  • Abstract
    This paper presents a study of flash memory field failures encountered in mobile phone applications. Failure analyses carried out by the flash memory manufacturers have been surveyed, and the failure root causes have been classified. Failure mechanism distributions are presented. Failures related to the manufacturing process defects are the dominant ones in the analyzed failure cases. Defect control and screening are key factors to field EFR (early failure rate) control, monitoring and improvement
  • Keywords
    circuit reliability; failure analysis; flash memories; mobile handsets; defect control; early failure rate; failure analysis; flash memory field failures; manufacturing process defects; mobile phones; Costs; Degradation; Dielectric losses; Electronic equipment testing; Failure analysis; Flash memory; Mobile handsets; Nonvolatile memory; Stress; Voltage; EFR; Flash reliability; NOR flash; field failure;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2006. 44th Annual., IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-9498-4
  • Electronic_ISBN
    0-7803-9499-2
  • Type

    conf

  • DOI
    10.1109/RELPHY.2006.251235
  • Filename
    4017175