DocumentCode :
2731697
Title :
The investigation of optimal Si-SiGe hetero-structure thin-film solar cell with theoretical calculation and quantitative analysis
Author :
Liao, M.H. ; Ho, W.S. ; Chen, Y.-Y. ; Chang, S.T.
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear :
2010
fDate :
20-25 June 2010
Abstract :
The device performance such as short circuit current density (Jsc), open-circuit voltage (Voc), fill factor (FF), and efficiency of solar cells on the multi-crystalline SiGe on the Si with different Ge concentration are compared and investigated in this work. The average Ge concentration was systematically changed in the range from 0% to 30%. The appropriate addition of Ge in crystal Si is the effective way to increase the short circuit current density without affecting the open-circuit voltage, due to the modulation of the material energy band-gap. The band-gap of the SiGe can be extracted by Electron-Hole Plasma (EHP) model at different temperatures. With the optimization of Ge concentration and clean process condition, the overall efficiency of a Si0.9Ge0.1 based solar cell is found to be improved about ~4% than the control mc-Si solar cell. Moreover, the SiGe based solar cell has also been observed that it has less operated temperature sensitivity than Si solar cell for the real application. The theoretical calculation and simulation work help us to understand and engineer the high-efficiency SiGe solar cell qualitatively.
Keywords :
elemental semiconductors; germanium; semiconductor plasma; silicon; solar cells; thin film devices; SiGe; electron hole plasma model; fill factor; heterostructure thin film solar cell; material energy bandgap; open circuit voltage; short circuit current density; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5614052
Filename :
5614052
Link To Document :
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