DocumentCode :
2732058
Title :
Paper study on thermal conductivity of Al2O3 thin film of different thicknesses on copper substrate under different contact pressures
Author :
Dinash, K. ; Mutharasu, D. ; Lee, Y.T.
Author_Institution :
Nano Opto Electron. Lab. (NOR), Univ. Sains Malaysia (USM), Minden, Malaysia
fYear :
2011
fDate :
25-28 Sept. 2011
Firstpage :
620
Lastpage :
623
Abstract :
Thermal interface resistance of solids is an important factor for heat conduction from one solid to another. Interface resistance disrupts heat flow in systems like CPUs and various solid state devices like LEDs. Interface materials play an important role in heat transport through interface. In this study, Al2O3 with different thickness was coated on a copper substrate. The overall thermal conductivity of the material is measured at different contact pressures. It was observed that overall thermal conductivity of the system was affected by thickness of the Al2O3. It was also observed that the overall thermal conductivity increases with increasing pressure.
Keywords :
aluminium compounds; contact resistance; thermal conductivity; thin films; Al2O3; Cu; contact pressures; contact resistance; copper substrate; heat conduction; heat flow; heat transport; thermal conductivity; thermal interface resistance; thin film; Conductivity; Copper; Heat sinks; Heating; Materials; Resistance; Thermal conductivity; Al2O3; TIM; Thermal conductivity; contact resistance; interface resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics and Applications (ISIEA), 2011 IEEE Symposium on
Conference_Location :
Langkawi
Print_ISBN :
978-1-4577-1418-4
Type :
conf
DOI :
10.1109/ISIEA.2011.6108789
Filename :
6108789
Link To Document :
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