• DocumentCode
    2732058
  • Title

    Paper study on thermal conductivity of Al2O3 thin film of different thicknesses on copper substrate under different contact pressures

  • Author

    Dinash, K. ; Mutharasu, D. ; Lee, Y.T.

  • Author_Institution
    Nano Opto Electron. Lab. (NOR), Univ. Sains Malaysia (USM), Minden, Malaysia
  • fYear
    2011
  • fDate
    25-28 Sept. 2011
  • Firstpage
    620
  • Lastpage
    623
  • Abstract
    Thermal interface resistance of solids is an important factor for heat conduction from one solid to another. Interface resistance disrupts heat flow in systems like CPUs and various solid state devices like LEDs. Interface materials play an important role in heat transport through interface. In this study, Al2O3 with different thickness was coated on a copper substrate. The overall thermal conductivity of the material is measured at different contact pressures. It was observed that overall thermal conductivity of the system was affected by thickness of the Al2O3. It was also observed that the overall thermal conductivity increases with increasing pressure.
  • Keywords
    aluminium compounds; contact resistance; thermal conductivity; thin films; Al2O3; Cu; contact pressures; contact resistance; copper substrate; heat conduction; heat flow; heat transport; thermal conductivity; thermal interface resistance; thin film; Conductivity; Copper; Heat sinks; Heating; Materials; Resistance; Thermal conductivity; Al2O3; TIM; Thermal conductivity; contact resistance; interface resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industrial Electronics and Applications (ISIEA), 2011 IEEE Symposium on
  • Conference_Location
    Langkawi
  • Print_ISBN
    978-1-4577-1418-4
  • Type

    conf

  • DOI
    10.1109/ISIEA.2011.6108789
  • Filename
    6108789