DocumentCode :
2732465
Title :
Fabrication of InGaAs quantum wire structures by As2 flux in molecular beam epitaxy
Author :
Sugaya, Takeyoshi ; Tanuma, Yasuhiko ; Nakagawa, Tadashi ; Sugiyama, Yoshinobu ; Yonei, Kenji
Author_Institution :
Electrotech. Lab., Tsukuba, Japan
fYear :
1997
fDate :
8-11 Sep 1997
Firstpage :
75
Lastpage :
78
Abstract :
InGaAs/InAlAs quantum wire structures on V-grooved substrates have been fabricated under As2 flux by molecular beam epitaxy. Under As2 flux, a smaller number of In atoms migrate than those under As4 flux to the V-groove bottom from the sidewall surface. The InAlAs layer on the V-grooved InP substrates grown under As 2 flux preserves the V-shape, whereas the V-shape cannot be preserved and the quantum wire structures cannot be fabricated under As 2 flux. The InGaAs quantum wires grown under As2 flux have good optical property
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; molecular beam epitaxial growth; semiconductor growth; semiconductor quantum wires; As2; As2 flux; As4; As4 flux; InGaAs quantum wire structures; InGaAs-InAlAs; InGaAs/InAlAs quantum wire structures; V-grooved substrates; molecular beam epitaxy; Atomic layer deposition; Etching; Fabrication; Indium compounds; Indium gallium arsenide; Indium phosphide; MOCVD; Molecular beam epitaxial growth; Substrates; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 1997 IEEE International Symposium on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7503-0556-8
Type :
conf
DOI :
10.1109/ISCS.1998.711566
Filename :
711566
Link To Document :
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