DocumentCode :
2732630
Title :
Advances in diamond surface channel FET technology with focus on large signal properties
Author :
Kubovi, M. ; Aleksov, A. ; Denisenko, A. ; Kohn, E.
Author_Institution :
Dept. of Electron. Devices & Circuits, Ulm Univ., Germany
fYear :
2002
fDate :
6-8 Aug. 2002
Firstpage :
90
Lastpage :
99
Abstract :
Field effect transistors based on a hydrogen induced p-type surface channel (surface channel FETs) have shown steady progress in the past. Devices with sub-μm gatelength have been fabricated and cut-off frequencies up to the mm-wave range could be extracted. However, large signal and power performance could only be reported recently. This is due to severe stability and degradation problems. These phenomena are largely related to the highly polar H-terminated diamond surface, although details are still in discussion. This contribution describes these instabilities and the recent progress obtained. To some extent this may also shine some light onto the nature of instabilities observed in GaN based devices.
Keywords :
carrier density; diamond; elemental semiconductors; passivation; power field effect transistors; semiconductor device measurement; stability; C; FET large signal properties; FET power performance; GaN based device instability; H; diamond surface channel FET technology; field effect transistors; high carrier density; hydrogen induced p-type surface channels; mm-wave range cut-off frequencies; passivation; polar H-terminated diamond surface; stability/degradation problems; sub-micron gatelengths; Cutoff frequency; Degradation; Dielectric substrates; FETs; Hydrogen; Insulation; Metal-insulator structures; Plasma properties; Schottky barriers; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Performance Devices, 2002. Proceedings. IEEE Lester Eastman Conference on
Print_ISBN :
0-7803-7478-9
Type :
conf
DOI :
10.1109/LECHPD.2002.1146736
Filename :
1146736
Link To Document :
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