• DocumentCode
    2732812
  • Title

    Comparison between Si-LDMOS and GaN-based microwave power transistors

  • Author

    Nuttinck, S. ; Gebara, E. ; Laskar, J. ; Rorsman, N. ; Olsson, J. ; Zirath, H. ; Eklund, K. ; Harris, M.

  • Author_Institution
    Yamacraw Design Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2002
  • fDate
    6-8 Aug. 2002
  • Firstpage
    149
  • Lastpage
    154
  • Abstract
    We present in this paper a performance comparison between Si-LDMOSTs with an optimized structure for high breakdown voltage, and AlGaN/GaN power HFETs, based on DC-I/V, small-signal and RF power measurement results.
  • Keywords
    III-V semiconductors; elemental semiconductors; gallium compounds; microwave power transistors; power MOSFET; power field effect transistors; semiconductor device breakdown; semiconductor device measurement; semiconductor device reliability; silicon; thermal stability; wide band gap semiconductors; AlGaN-GaN; AlGaN/GaN power HFET; DC-I/V power measurements; GaN-based FET; Si; Si-LDMOS microwave power transistors; high breakdown voltage optimized structures; power transistor performance comparison; reliability; small-signal RF power measurements; thermal stability; Aluminum gallium nitride; Costs; Gallium nitride; HEMTs; Integrated circuit reliability; MODFETs; Power measurement; Power transistors; Radio frequency; Silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Performance Devices, 2002. Proceedings. IEEE Lester Eastman Conference on
  • Print_ISBN
    0-7803-7478-9
  • Type

    conf

  • DOI
    10.1109/LECHPD.2002.1146744
  • Filename
    1146744