DocumentCode :
2733379
Title :
Performance and modeling of antimonide-based heterostructure backward diodes for millimeter-wave detection
Author :
Fay, P. ; Schulman, J.N. ; Thomas, S., III ; Chow, D.H. ; Boegeman, Y.K. ; Holabird, K.S.
Author_Institution :
Dept. of Electr. Eng., Notre Dame Univ., IN, USA
fYear :
2002
fDate :
6-8 Aug. 2002
Firstpage :
334
Lastpage :
342
Abstract :
Heterostructure backward diodes have been fabricated and characterized for use as zero-bias millimeter-wave detectors. Sensitive detector performance in the W-band was achieved by scaling the active area to 1.5×1.5 μm2 through the use of high-resolution i-line stepper lithography. Responsivities of 2450 V/W and 2341 V/W were measured on-wafer at 95 GHz and 110 GHz, respectively. The detectors exhibit good detection linearity, with 0.8 dB compression, measured at an RF power of 4 μW at 95 GHz. A nonlinear device model, based on bias-dependent millimeter-wave S-parameter measurements, has been developed. The model is consistent with the measured frequency response, responsivity, and detector compression characteristics. Extrapolation using the model to reduced device dimensions suggests that this device technology should provide appreciable responsivities (>1000 V/W) at frequencies through G-band and beyond.
Keywords :
III-V semiconductors; S-parameters; antimony compounds; frequency response; lithography; millimetre wave detectors; millimetre wave diodes; millimetre wave measurement; semiconductor device measurement; semiconductor device models; 1.5 micron; 110 GHz; 4 muW; 95 GHz; G-band/W-band detection; InAs-AlSb-GaSb; RF power detection; active area scaling; antimonide-based heterostructure backward diodes; bias-dependent mm-wave S-parameter nonlinear device models; detection linearity; detector compression; detector responsivity; extrapolated device dimension reduction; frequency response; high-resolution i-line stepper lithography; millimeter-wave detection; zero-bias mm-wave detectors; Detectors; Diodes; Frequency measurement; Linearity; Lithography; Millimeter wave measurements; Millimeter wave technology; Power measurement; Radio frequency; Scattering parameters;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Performance Devices, 2002. Proceedings. IEEE Lester Eastman Conference on
Print_ISBN :
0-7803-7478-9
Type :
conf
DOI :
10.1109/LECHPD.2002.1146772
Filename :
1146772
Link To Document :
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