Title :
Characterization and analysis of gate and drain low-frequency noise in AlGaN/GaN HEMTs
Author :
Hsu, Shawn S.H. ; Valizadeh, Pouya ; Pavlidis, Dimitris ; Moon, J.S. ; Micovic, M. ; Wong, D. ; Hussain, T.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
The gate and drain low-frequency noise (LFN) characteristics of 0.15×200 μm2 AlGaN/GaN HEMTs are reported. The measured gate noise current spectral density is low and insensitive to the applied high reverse bias voltage between the gate and the drain. Typical gate noise level values vary from ∼1.9×10-19 to ∼3.4×10-19 (A2/Hz) as the drain voltage increases from 1 V to 12 V (VG=-5 V) at 10 Hz. The calculated Hooge parameter is ∼5.9×10-4, which is comparable to traditional III-V FETs. Lorentz noise components were observed when VDS is higher than 8 V. The peak of Lorentz component moves toward higher frequency when VDS increases and VGS decreases. The exponent γ of the 1/fl was found to reduce from 1. 17 to 1.0 1 when VDS increases from 8 V to 16 V. The observed trends are discussed in terms of electric field, carrier velocity and trapping-detrapping considerations.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; microwave field effect transistors; semiconductor device noise; wide band gap semiconductors; 0.15 micron; 1 to 12 V; 8 to 16 V; AlGaN-GaN; AlGaN/GaN; HEMTs; Hooge parameter; Lorentz noise components; carrier velocity; drain low-frequency noise; electric field; gate noise current spectral density; reverse bias voltage; trapping-detrapping considerations; Aluminum gallium nitride; Current measurement; Density measurement; Gallium nitride; HEMTs; Low-frequency noise; MODFETs; Noise level; Noise measurement; Voltage;
Conference_Titel :
High Performance Devices, 2002. Proceedings. IEEE Lester Eastman Conference on
Print_ISBN :
0-7803-7478-9
DOI :
10.1109/LECHPD.2002.1146787