Title :
Localized Micro-Inserts Connection for Smart Card Secure Micro Packaging
Author :
Brun, J. ; Franiatte, R. ; Puget, C. ; Souriau, J.C. ; Mathieu, L. ; Ponthenier, G. ; Sillon, N. ; Bonvalot, B. ; Depoutot, F. ; Barbe, S.
Author_Institution :
LETI, CEA, Grenoble
Abstract :
Smart card integrated circuits are never completely immune against any invasive attack (chemical, physical or energetic), and a hardware protection of the chip could be necessary. One solution consists in shielding the devices at the wafer level with a silicon structured cap (Sishelltrade). In order to increase security, this cap can also comport active functions. In this case electrical connections between the two wafers are necessary. This paper presents a new solution to interconnect two wafers, compatible with smart cards integration requirements. Starting from a previous technology on anisotropic conductive film, hard localised Z axis micro-bumps are grown directly on wafer pads. Electrical contact and bonding are obtained simultaneously by thermo-compression at wafer level (top wafer on base wafer supporting the micro-bumps and glue). During this step, hard micro-bumps brake native oxide and create intimate contact with the top wafer Al pads. Two kinds of glue were implemented to obtain wafer bonding: epoxy and polyimide
Keywords :
aluminium compounds; integrated circuits; smart cards; wafer bonding; wafer level packaging; Al; Sishell; anisotropic conductive film; epoxy; hard micro-bump; invasive attack; microinsert connection; polyimide; secure micro packaging; silicon structured cap; smart card integrated circuits; wafer bonding; wafer level shielding; wafer level thermo-compression; Chemicals; Contacts; Hardware; Integrated circuit packaging; Protection; Security; Silicon; Smart cards; Wafer bonding; Wafer scale integration;
Conference_Titel :
High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-9292-2
Electronic_ISBN :
0-7803-9293-0
DOI :
10.1109/HDP.2005.251415