DocumentCode
2735281
Title
n-type silicon solar cells with amorphous/crystalline silicon heterojunction rear emitter
Author
Bivour, Martin ; Meinhardt, Christoph ; Pysch, Damian ; Reichel, Christian ; Ritzau, K-U ; Hermle, Martin ; Glunz, Stefan W.
Author_Institution
Fraunhofer Inst. for Solar Energy Syst. (ISE), Freiburg, Germany
fYear
2010
fDate
20-25 June 2010
Abstract
We present the first silicon solar cells processed at Fraunhofer ISE featuring an amorphous/crystalline silicon heterojunction rear emitter and a diffused front surface field. In this work, we focus on the optimization of the silicon heterojunction rear emitter of n-type silicon solar cells with regards to the intrinsic hydrogenated amorphous silicon a-Si:H(i) and boron-doped hydrogenated amorphous silicon a-Si:H(p) layer thickness and the influence of a transparent conducting oxide layer on the rear emitter surface. Efficiencies up to 19.1% (Voc = 687 mV, Jsc = 34.9 mA/cm2, FF = 79.9%) have been reached for non-textured solar cells on n-type absorbers. Furthermore, we attained an efficiency of 19.8% on textured p-type absorbers featuring an amorphous/crystalline silicon heterojunction rear emitter.
Keywords
amorphous semiconductors; elemental semiconductors; silicon; solar cells; amorphous crystalline silicon heterojunction rear emitter; diffused front surface field; layer thickness; n-type silicon solar cells; textured p-type absorbers; transparent conducting oxide layer; Fingers; Heterojunctions; Indium tin oxide; Passivation; Photovoltaic cells; Resistance; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location
Honolulu, HI
ISSN
0160-8371
Print_ISBN
978-1-4244-5890-5
Type
conf
DOI
10.1109/PVSC.2010.5614252
Filename
5614252
Link To Document