DocumentCode
2735759
Title
12.4% efficient freestanding 30µm ultra-thin silicon solar cell using a-Si/c-Si heterostructure
Author
Chhabra, Bhumika ; Opila, Robert L. ; Honsberg, Christiana B.
Author_Institution
Dept. of Mater. Sci. & Eng., Univ. of Delaware, Newark, DE, USA
fYear
2010
fDate
20-25 June 2010
Abstract
The goal of this work is to demonstrate and analyze heterojunction devices on ultra-thin silicon wafers with imperfect surfaces and lower minority carrier lifetimes. Our previous results show intrinsic amorphous-Si passivation (i-a-Si) gives surface recombination velocity, S ~ 20 cm/sec on freestanding 35 μm Si wafers (Chhabra et al., 2008), and the work presented in this paper shows S ~ 84 cm/sec on chemically etched wafers. The degradation in the S values is assumed mainly due to the contamination in the PECVD deposition system. The simulated results for this work show that the dominant loss mechanism is the low absorption in the a-Si layer thickness. The device results show that even without light trapping, texturing, optimizations, and with minority carrier lifetimes ~ 18 μs, the structure can have realistic voltages ~ 613 mV and efficiencies ~ 12.4%.
Keywords
carrier lifetime; passivation; plasma CVD; silicon; solar cells; surface recombination; PECVD deposition system; Si-Si; carrier lifetimes; chemically etched wafers; dominant loss mechanism; heterojunction devices; intrinsic amorphous-Si passivation; light trapping; size 30 mum; surface recombination velocity; ultra-thin silicon solar cell; ultra-thin silicon wafers; Green products; Radiative recombination; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location
Honolulu, HI
ISSN
0160-8371
Print_ISBN
978-1-4244-5890-5
Type
conf
DOI
10.1109/PVSC.2010.5614352
Filename
5614352
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