Title :
Design and Technology Collaboration
Author :
Chiang, Shang-Yi
Author_Institution :
TSMC, Hsinchu
Abstract :
With the advancement of technology into the nanometer regime, the complexity of design at advanced technology has escalated exponentially. Notable areas of difficulty are timing closure, signal integrity, power optimization etc. Advanced foundries, with estimated close to 40% of worldwide 90nm tapeouts, are taking several initiatives to help designers make best use of the technologies to produce designs that are competitive in both performance and cost structure. In this presentation, the author will discuss the key initiatives in TSMC´s design collaboration and share collaboration results
Keywords :
electronic design automation; foundries; groupware; integrated circuit design; nanoelectronics; 90 nm; TSMC design collaboration; advanced technology; design complexity; nanometer regime; power optimization; signal integrity; technology collaboration; timing closure; Collaboration; Costs; Electronics industry; Foundries; Libraries; Manufacturing industries; Research and development; Semiconductor device manufacture; Strontium; Timing;
Conference_Titel :
Asian Solid-State Circuits Conference, 2005
Conference_Location :
Hsinchu
Print_ISBN :
0-7803-9162-4
Electronic_ISBN :
0-7803-9163-2
DOI :
10.1109/ASSCC.2005.251774
