DocumentCode :
2736678
Title :
Compact X-Band High Gradient Photoinjector and Accelerator for Compton Scattering
Author :
DeStefano, C. ; Heritage, J.P. ; Luhmann, N.C., Jr. ; Frederick, W.J. ; Vlieks, A.E. ; Caryotakis, G.
Author_Institution :
California Davis Univ., Davis
fYear :
2006
fDate :
18-22 Sept. 2006
Firstpage :
148
Lastpage :
148
Abstract :
The advent of X-band vacuum technologies has allowed for the construction of compact electron beam sources able to deliver 60 MeV ultra-short bunches previously only realizable in large scale national laboratories. Using a novel frequency selection scheme a titantium: sapphire laser oscillator serves as both optical source for the photoinjector and master clock for the microwave components. Additionally the table-top laser amplifiers, also seeded by the oscillator, are inherently synchronized to the RF sources. This allows for a simplified collinear Compton scattering X-ray source tunable from 10 to 80 keV. Successful operation of the system has demonstrated initial signs of Compton X-rays.
Keywords :
Compton effect; X-ray scattering; electron accelerators; electron sources; klystrons; linear accelerators; particle beam bunching; particle beam injection; sapphire; solid lasers; titanium; Al2O3:Ti; Compton scattering; RF sources; X-band accelerator; X-band high gradient photoinjector; X-band vacuum technologies; X-ray source; X-rays detection; electron beam sources; electron volt energy 10 keV to 80 keV; electron volt energy 60 MeV; frequency 8 GHz to 12 GHz; frequency selection scheme; klystron; laser oscillator; master clock; microwave components; table-top laser amplifiers; ultra-short bunches; Electron beams; Frequency; Laboratories; Large-scale systems; Masers; Microwave oscillators; Optical scattering; Vacuum technology; X-ray lasers; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Infrared Millimeter Waves and 14th International Conference on Teraherz Electronics, 2006. IRMMW-THz 2006. Joint 31st International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0400-2
Electronic_ISBN :
1-4244-0400-2
Type :
conf
DOI :
10.1109/ICIMW.2006.368356
Filename :
4222090
Link To Document :
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