DocumentCode :
2738045
Title :
Large area macroporous silicon layers for monocrystalline thin-film solar cells
Author :
Ernst, Marco ; Brendel, Rolf
Author_Institution :
Inst. for Solar Energy Res. Hamelin (ISFH), Emmerthal, Germany
fYear :
2010
fDate :
20-25 June 2010
Abstract :
We produce uniform macroporous double-layers on 6 inch n-type silicon substrates by electrochemical etching under rear side illumination in a hydrofluoric acid (HF)-based electrolyte. The etched area is circular with a diameter of 13 cm. We demonstrate the detachment of 20 μm thick free-standing macroporous silicon layers with an area of 8 × 8 cm2.
Keywords :
elemental semiconductors; etching; porous semiconductors; semiconductor thin films; silicon; solar cells; substrates; HF-based electrolyte; Si; electrochemical etching; etched area; hydrofluoric acid-based electrolyte; large area macroporous layers; monocrystalline thin film solar cells; n-type silicon substrate; rear side illumination; size 20 mum; size 6 inch; uniform macroporous double layers; Epitaxial growth; Microscopy; Optical microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5614496
Filename :
5614496
Link To Document :
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