DocumentCode :
2738491
Title :
Electron Transport Across Interfaces in Horizontal Carbon Nanofiber Interconnects
Author :
Yamada, T. ; Suzuki, M. ; Kitsuki, H. ; Saito, T. ; Fabris, D. ; Sun, X. ; Wilhite, P. ; Yang, C.Y.
Author_Institution :
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
fYear :
2008
fDate :
18-21 Aug. 2008
Firstpage :
263
Lastpage :
266
Abstract :
In a carbon nanofiber (CNF) metal contact such as a bridge between two metallic electrodes, passing high current (current stressing) reduces the total resistance of the system (CNF resistance RCNF and contact resistance Rc) by orders of magnitude. The role of current stressing is modeled as a reduction in the interfacial tunneling gap with transport characteristics attributed to tunneling between Au and CNF. The model predicts a reduction in Rc and the nonlinearity in the current-voltage (I-V) characteristics gradually disappears as Rc decreases. These results are consistent with I-V behavior measured experimentally.
Keywords :
carbon fibres; contact resistance; gold; integrated circuit interconnections; nanostructured materials; semiconductor-metal boundaries; tunnelling; Au-C; carbon nanofiber-metal contact; contact resistance; current stressing; current-voltage characteristics; electron transport; horizontal carbon nanofiber interconnects; interfacial tunneling gap; metallic electrodes; Bridge circuits; Contact resistance; Current measurement; Electric breakdown; Electrical resistance measurement; Electrodes; Electrons; Gold; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, Texas
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
Type :
conf
DOI :
10.1109/NANO.2008.84
Filename :
4617066
Link To Document :
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