Title :
Design and Characterization of Carbon Nanofibers for Via Applications
Author :
Wu, Wen ; Nguyen, Dinh ; Wilhite, Patrick ; Saito, Tsutomu ; Krishnan, Shoba ; Yang, Cary Y.
Author_Institution :
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
Abstract :
This paper presents results for structural characterization of carbon nanofibers (CNFs) for interconnect via applications. Vertically aligned CNFs were grown in a plasma-enhanced chemical vapor deposition (PECVD) system. We characterized the surface topographies of CNF via structures using atomic force microscopy (AFM). We also demonstrated the capability of capturing one single CNF using the AFM current-sensing technique. Moreover, the correlation between the CNF density and via resistances was analyzed theoretically.
Keywords :
atomic force microscopy; carbon nanotubes; integrated circuit interconnections; nanostructured materials; plasma CVD; surface topography; AFM current-sensing technique; C; CNF density; atomic force microscopy; carbon nanofibers; interconnect; plasma-enhanced chemical vapor deposition; structural characterization; surface topography; Atomic force microscopy; Electrodes; Filling; Nanostructures; Nickel; Plasma temperature; Probes; Scanning electron microscopy; Silicon; Surface topography;
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
DOI :
10.1109/NANO.2008.95
