• DocumentCode
    2739622
  • Title

    Hybrid III–V silicon evanescent lasers with vertical sidewalled gratings

  • Author

    Veerasubramanian, Venkat ; Beaudin, Guillaume ; Giguère, Alexandre ; LeDrogoff, Boris ; Aimez, Vincent ; Kirk, Andrew G.

  • Author_Institution
    McGill Univ., Montréal, QC, Canada
  • fYear
    2011
  • fDate
    10-12 Jan. 2011
  • Firstpage
    133
  • Lastpage
    134
  • Abstract
    A hybrid III-V silicon evanescent laser with sidewalled gratings as the feedback element, and having 60% waveguide confinement is proposed. The device is fabricated using e-beam lithography, and low-temperature plasma assisted direct bonding.
  • Keywords
    III-V semiconductors; bonding processes; diffraction gratings; distributed feedback lasers; electron beam lithography; elemental semiconductors; indium compounds; laser feedback; optical fabrication; plasma materials processing; semiconductor lasers; silicon; waveguide lasers; InP-Si; e-beam lithography; feedback element; hybrid III-V silicon evanescent lasers; low-temperature plasma assisted direct bonding; vertical sidewalled gratings; waveguide confinement; Distributed feedback devices; Gratings; Laser feedback; Laser modes; Optical waveguides; Silicon; Waveguide lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Winter Topicals (WTM), 2011 IEEE
  • Conference_Location
    Keystone, CO
  • Print_ISBN
    978-1-4244-8428-7
  • Type

    conf

  • DOI
    10.1109/PHOTWTM.2011.5730083
  • Filename
    5730083
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2739622