"True Water-Based Cleaning Innovations to Replace Solvent Based Defluxing Products"

The field of cleaning applications related to modern semiconductor production technologies covers very different types of substrates and tasks. Modern water-based cleaning technologies such as microphase cleaning (MPC) and fast acting surfactant technology (FAST) are used in defluxing after different manufacturing processes such as wafer bumping, flip-chip assembly and die-attach used for power modules and devices. The cleaning agents to be used for Semicon Backend applications should be water based and their chemical content should have the ability to remove different kinds of fluxes and solder pastes even from difficult areas at moderate process parameters. Lastly, the cleaning agents should be compatible for various polymers and metals and should have high loading capacity or bath life.