DocumentCode :
2739823
Title :
DuPont Fluorochemical materials in TSV process
Author :
Lee, Terry
Author_Institution :
DuPont Fluorochemical/DuPont Taiwan Ltd., Taipei
fYear :
2008
fDate :
22-24 Oct. 2008
Firstpage :
249
Lastpage :
250
Abstract :
As a result of Montreal Protocol, CFCs included Freon TES and Genesolv DES in electronic assemblies cleaning as well as de-flux solvent for Surface Mounting Technology, SMT, in PCB industry has been banned for production. DuPont fluorochemical came up with the effective alternative, Vertrelreg, with zero ODP (Ozone Depletion Potential) as special fluids for cleaning and which also is proven as an effective fluorinated polymer remover in Through Silicon Via, TSV, process required of the advance package industry. Beyond the solution of polymer remover, DuPont Fluorochemical also introduces the cost effective Zyronreg C4F8 in the Deep Reactive Ion Etching, DRIE, process of the TSV required.
Keywords :
electronics packaging; sputter etching; DuPont fluorochemical materials; Vertrel; cleaning; deep reactive ion etching; fluorinated polymer remover; package industry; through silicon via process; zero ozone depletion potential; Assembly; Cleaning; Electronics industry; Industrial electronics; Polymers; Production; Protocols; Solvents; Surface-mount technology; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly & Circuits Technology Conference, 2008. IMPACT 2008. 3rd International
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-3623-1
Electronic_ISBN :
978-1-4244-3624-8
Type :
conf
DOI :
10.1109/IMPACT.2008.4783857
Filename :
4783857
Link To Document :
بازگشت